Preparation and physical characterization of diamond thin films
DOI:
https://doi.org/10.21754/tecnia.v17i1.386Keywords:
thin films, diamond, solar panels, optical view guidesAbstract
This project involves the elaboration of diamond thin films from a plasmatic method, developed at the Laboratory of Optics and Semiconductors. The corresponding optical and electrical characterization of the elaborated materials.
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References
[1] Bachmann, P. K., Van Enckevort, W., “Diamond deposition technology”. Diamond and Related Materials, pp. 1, 1021-1034, Holanda, 1992.
[2] Findeling-Dufour, C., et a1. “Growth of large single-crystal diamond layers: analysis of the junctions between adjacent diamonds”. Diamond and Related Materials, pp. 996 - 998, Holanda, 1998.
[3] Hartman, P., Perdock, W. G., “On the relation between structure and morphology of crystals I”. Act. Cryst., pp. 8, 49-52, USA, 1955.
[4] Badzian, A. R., et at. “Cristallization of diamond from the gas phase. PartI “Material Research Bulletln, pp. 23, 385-400, USA, 1987.
[5] Touzelbaev, M. N., Goodson, K. E., “Applications of Micron-Scale Passive Diamond Layers for the IC and MEMS
Industries”. Diamond and Related Materials. Vol 7. pp 1-14, 7, Holanda, 1998.
[6] Goodson, K. E., “Impact of CVD Diamond Layers on the Thermal Engineering of Electronic Systems”. Annual Review of Heat Transfer. Vol 6. pp. 323-353, Begell. N.Y. 1995.
[7] Badzian, A. R., et al. “Cristallization of diamond crystals and films by microwave assisted CVD, Partll”. Material Research Bulletin, pp. 23, 531-548, USA, 1988.
[8] Simon, P., Lichte, H., Moenter, D., Reschetilowski, W., Valera, A., Carrillo- Cabrera, W., “Electron Holography, a Versatile Too1 for Characterization of Materials: Fluoroapatite-Gelatine-Composites, SiC and SiO ”. Z. Anorg. Allg. Cliem, pp. 631, 983-992, Alemania, 2005.
[9] Valera, A., “Grown of Nano-crystalline Silicon carbide (SIC) semiconductor films by a non conventional DC plasma assisted deposition system”, Lima, Perú. Reporte Técnico UNI, 2005, a ser publicado próximamente.
[2] Findeling-Dufour, C., et a1. “Growth of large single-crystal diamond layers: analysis of the junctions between adjacent diamonds”. Diamond and Related Materials, pp. 996 - 998, Holanda, 1998.
[3] Hartman, P., Perdock, W. G., “On the relation between structure and morphology of crystals I”. Act. Cryst., pp. 8, 49-52, USA, 1955.
[4] Badzian, A. R., et at. “Cristallization of diamond from the gas phase. PartI “Material Research Bulletln, pp. 23, 385-400, USA, 1987.
[5] Touzelbaev, M. N., Goodson, K. E., “Applications of Micron-Scale Passive Diamond Layers for the IC and MEMS
Industries”. Diamond and Related Materials. Vol 7. pp 1-14, 7, Holanda, 1998.
[6] Goodson, K. E., “Impact of CVD Diamond Layers on the Thermal Engineering of Electronic Systems”. Annual Review of Heat Transfer. Vol 6. pp. 323-353, Begell. N.Y. 1995.
[7] Badzian, A. R., et al. “Cristallization of diamond crystals and films by microwave assisted CVD, Partll”. Material Research Bulletin, pp. 23, 531-548, USA, 1988.
[8] Simon, P., Lichte, H., Moenter, D., Reschetilowski, W., Valera, A., Carrillo- Cabrera, W., “Electron Holography, a Versatile Too1 for Characterization of Materials: Fluoroapatite-Gelatine-Composites, SiC and SiO ”. Z. Anorg. Allg. Cliem, pp. 631, 983-992, Alemania, 2005.
[9] Valera, A., “Grown of Nano-crystalline Silicon carbide (SIC) semiconductor films by a non conventional DC plasma assisted deposition system”, Lima, Perú. Reporte Técnico UNI, 2005, a ser publicado próximamente.
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Published
2007-06-01
How to Cite
[1]
A. Valera Palacios and E. Ramos, “Preparation and physical characterization of diamond thin films”, TECNIA, vol. 17, no. 1, pp. 79–85, Jun. 2007.
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